(Nanowerk News) Led by Prof. Wei Yayi, a team of researchers from the University of Chinese Academy of Sciences (UCAS) has achieved a significant breakthrough in enhancing the final pattern fidelity ...

Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...

The next generation of Mentor Graphics' optical-proximity correction (OPC) tool has arrived, bringing with it a number of innovations that result in improved simulation accuracy. The next generation ...

Fig. 1 The lithography process. The projection lithography system. The advancement of semiconductor manufacturing is a key driver of electronic device innovations. As Moore’s Law progresses, ...

At process geometries of 90 nm and below, IC yield is virtually impossible to achieve without optical proximity correction (OPC). But runtimes for OPC tools become very lengthy at 90 nm. Furthermore, ...

Researchers review AI-powered inverse lithography, showing how deep learning boosts chip patterning precision and efficiency while facing scaling challenges. Computational lithography optimizes the ...