TOKYO, December 12, 2024--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of ...
The semiconductor industry is rethinking the manufacturing flow for extreme ultraviolet (EUV) lithography in an effort to improve the overall process and reduce waste in the fab. Vendors currently are ...
YOKOHAMA—After a decade of development, Canon Inc. began selling lithography equipment for semiconductor production, hoping to reclaim a share in the market. The equipment is used to print fine ...
In a recent study published in Science, a group of Researchers at the University of Chicago, in collaboration with the Argonne National laboratory, have recently developed a novel method they termed ...
It’s the worst-kept secret in the industry. Extreme ultraviolet (EUV) lithography has missed the initial stages of the 10nm logic and 1xnm NAND flash nodes. Chipmakers hope to insert EUV by the latter ...
Researchers from the University of Southampton have demonstrated a new patterning technology that makes it possible to create high-quality nanostructured surfaces for infrared thermal control coatings ...
IBM develops an optical lithography technique capable of producing structures less than 32 nm in size which its says gives the industry seven years of breathing space. Scientists at IBM say they have ...
Princeton Instruments/Acton, the world s leading provider of high-end optics and optical coatings, continues to push the boundaries of technology with the new ExciLife-193, high durability, 193nm ...
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