Double patterning (DP), as the simplest form of multi-patterning techniques, is receiving lots of attention right now. The need for double patterning techniques is driven by the physical limits of the ...
MONTEREY, Calif. — ASML Holding NV has quietly inserted 193-nm immersion with double-patterning techniques on its roadmap, claiming that the technology is the “only” lithographic solution for the ...
SAN FRANCISCO — Amid probable delays for extreme ultraviolet (EUV) lithography, ASML, Canon and Nikon are updating their roadmaps, racing each other to capitalize on the shift towards ...
As semiconductor devices become more complex, so do the methods for patterning them. Ever-smaller features at each new node require continuous advancements in photolithography techniques and ...
Extreme UV lithography (EUVL) and 193 nm immersion lithography enhanced by double-patterning techniques will be sufficient to maintain the lithography roadmap for several technology nodes. That was ...
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