Imec has demonstrated the capability of directed self-assembly (DSA) to pattern line/spaces with a pitch as small as 18nm, using a high-chi block copolymer (high-χ BCP) based process under high volume ...

There are still some problems to work out, such as cutting defect rates, but directed self-assembly has the potential to reduce the total number of masks. The upcoming 7nm process node presents tough ...

Self-assembly of block-copolymers provides a route to the fabrication of small (size, <50 nm) and dense (pitch, <100 nm) features with an accuracy that approaches even the demanding specifications for ...